Low temperature, low pressure nanoimprinting of chitosan as a biomaterial for bionanotechnology applications

Microand nanoscale structures of chitosan were fabricated by nanoimprinting lithography and biochemically functionalized for bionanodevice applications. Chitosan solutions were prepared and a nanoimprinting process was developed for it, where chitosan solution is used as a functional resist for nanoimprinting lithography. A low temperature 90 °C and low pressure 5–25 psi nanoimprinting with polydimethylsiloxane mold could achieve not only microscale structures but also nanoscale features such as nanowire and nanodots down to 150 nm dimensions. The nanoimprinted structures were chemically modified and used for the immobilization of protein molecules. © 2007 American Institute of Physics. DOI: 10.1063/1.2709914